| http://www.w3.org/ns/prov#value | - ion from said reticle through said exit pupil onto a wafer placed on a wafer chuck; said optical system including a deformable mirror proximal to said exit pupil; wherein said deformable reticle chuck and said deformable mirror are controlled such that aberration and distortion of an image of said reticle formed on said wafer by said optical system are corrected based on the height measured by sai
|
