About: http://webisa.webdatacommons.org/259788414

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Like the original Micron-developed improved split-polysilicon CMOS process, the new split-polysilicon silicide process, which is the focus of the present invention, also utilizes eight masks to fabricate both types of transistors.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr