| http://www.w3.org/ns/prov#value | - ively remove the exposed area or un-exposed area of the photo-sensitive layer. [0377] Also electronic devices such as a semiconductor device having a fine pattern can be produced by etching a substrate layer under the so-obtained fine pattern using the fine pattern as a mask. [0378] Further in the method of forming a fine pattern of the present invention, as explained above, when light having a sh
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