About: http://webisa.webdatacommons.org/261712460

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Typically, the stress in silicon nitride films formed by PECVD is modulated by optimizing gas flows, plasma powers and other deposition parameters.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com