| http://www.w3.org/ns/prov#value | - 20120139047SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Disclosed is a semiconductor device, comprising a substrate, a channel region in the substrate, source/drain regions on both sides of the channel region, a gate structure on the channel region, and gate sidewall spacers formed on the sidewalls of the gate structure, characterized in that each of the source/drain regions compris
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