| http://www.w3.org/ns/prov#value | - imensions using multiple masksUS72884459 mai 200530 oct. 2007International Business Machines CorporationDouble gated transistor and method of fabricationUS72915601 ao???t 20056 nov. 2007Infineon Technologies AgMethod of production pitch fractionizations in semiconductor technologyUS7723007 *28 janv. 200525 mai 2010Tokyo Ohka Kogyo Co., Ltd.Polymer compound, photoresist composition including the po
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