| http://www.w3.org/ns/prov#value | - The process previously described for removal of any native oxide on the surface of silicon substrate 22 using strontium, barium, a combination of strontium and barium or other alkaline earth metals or a combination of alkaline earth metals and the preparation of silicon substrate 22 for growth of a monocrystalline oxide layer with reference to FIGS. 1???3 may be used (20).
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