| http://www.w3.org/ns/prov#value | - Known metal precursors often have: low volatility which severely limits achievable deposition rate; limited stability and therefore decompose or react before reaching the substrate; or have ligands (molecules, ions, or atoms attached to a central atom) which fail to completely dissociate from the metal upon reaching the substrate, leaving impurities such as carbon or fluorine in the deposited film
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