| http://www.w3.org/ns/prov#value | - In a third form of the resist composition of the present invention, the base resin used as the major component (A) is a polymer of the following rational formula (3): ##STR7## wherein each of R1, R3 and R5 is a hydrogen atom or methyl group, R7 is a tert-butyl, methoxymethyl, tetrahydropyranyl, or trialkylsilyl group, R8 is a lower alkoxy group such as a methoxy and ethoxy group or a hydrogen atom
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