| http://www.w3.org/ns/prov#value | - In embodiments, the insulator layer 16 is an oxide material, such as SiO2 or Al2O3, deposited at temperatures compatible with aluminum wiring, e.g., under about 420?? C. and preferably under about 400?? C. Deposition options for insulator layer 16 include, for example, one or more of plasma-enhanced CVD (PECVD), sub-atmospheric CVD (SACVD), atmospheric pressure CVD (APCVD), high density plasma CVD
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