| http://www.w3.org/ns/prov#value | - In the photomask producing method of the invention, the step of forming the contour of the light-shielding film region preferably includes the step of etching, after forming the contour of the light-shielding film region, a portion of the transparent substrate located outside the light-shielding film region such that a phase difference of (170+360???n) to (190+360???n) degrees (where n is an integ
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