| http://www.w3.org/ns/prov#value | - In the process, a gas mixture containing fluorocarbon, sulfur and oxygen reactants is energized into a plasma state and during the etching process the sulfur and oxygen synergistically react to prevent polymer build-up from causing a phenomenon known as ???etch stop.??? Etch stop is a problem which occurs during plasma etching of deep and narrow openings in silicon oxide using gas chemistries whic
|
