| http://www.w3.org/ns/prov#value | - In embodiments where the substance to be removed is selected from, for example, mono-crystalline silicon, poly-crystalline silicon, amorphous silicon, and the said materials doped with elements such as boron, phosphorous, and arsenic, and combinations thereof, the gas mixture may contain one or more reactive gases selected from certain halogen containing gases such as F2, NF3, XeF2, CF4, C2F6, C3F
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