| http://www.w3.org/ns/prov#value | - In the case of a silicon nitride layer, the layer can be formed in the same way by spin coating using a commercially available inorganic SOG having amino groups, but preferably it is formed using plasma enhanced CVD. As the gases used, a silane such as monosilane, disilane, and trisilane may be used for the silicon source, ammonia, hydrazine, etc. may be used for the nitrizing agent, and nitrogen,
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