| http://www.w3.org/ns/prov#value | - In other words, the method for forming a resist pattern comprises steps of (i) dissolving a composition for forming an antireflective coating film in a solvent to prepare a coating solution, applying the coating solution to a substrate such as silicon wafer and glass substrate by a known coating means such as applicator, bar coater, spinner and curtain flow coater and drying the coated material to
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