| http://www.w3.org/ns/prov#value | - In addition, the invention can be applied to an exposure apparatus that transfers a circuit pattern onto a glass substrate, a silicon wafer or the like to manufacture a reticle or a mask used for exposure apparatuses, such as an optical exposure apparatus, an EUV exposure apparatus, an X-ray exposure apparatus, and an electron beam exposure apparatus, in addition to manufacturing microdevices, suc
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