| http://www.w3.org/ns/prov#value | - In this Example, starting structure 1100 was a stack of layers (not shown to scale) which included, from top to bottom, a 5,000 ??? thick layer 1108 of a chemically amplified DUV photoresist, DX1100 (available from AZ Clariant Corp. of Somerville, N.J.); a 470 ??? thick layer 1106 of an organic ARC identified as KRF 17G (available from AZ/Clariant); a 250 ??? thick layer 1105 of chromium oxynitrid
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