| http://www.w3.org/ns/prov#value | - ncluding low temperature plasma deposition of an optical absorption layer and high speed optical annealingUS7132618Feb 6, 2003Nov 7, 2006Applied Materials, Inc.MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionUS7137354Aug 22, 2003Nov 21, 2006Applied Materials, Inc.Plasma immersion ion implantation apparatus including a plasma source having low dissociation
|
