| http://www.w3.org/ns/prov#value | - In a conventional X-ray lithography exposure apparatus, after synchrotron radiation light emitted from an X-ray lithography light source is reflected by an optical system including a mirror apparatus, the light is guided into a sealed exposure chamber through an X-ray filter made of a material such as beryllium (Be) and illuminates an X-ray lithography mask (referred to as an X-ray mask hereinafte
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