| http://www.w3.org/ns/prov#value | - Another aspect of the present invention is a method for forming a common ground for an electromechanical device, further comprising acts of: depositing a sacrificial layer over the conducting layer; depositing an anchor site photoresist pattern to provide for an anchor site; etching through the sacrificial layer to expose a portion of the conducting layer at a DC electrode region to form an anchor
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