| http://www.w3.org/ns/prov#value | - In the past, in the manufacture of semiconductor devices, liquid crystal display elements, etc., using photolithographic techniques, an exposure apparatus has been used in which a pattern formed on a photomask (hereinafter referred to as mask) or reticle is projected and exposed on each shot area of a photosensitive substrate such as a semiconductor wafer or glass plate, etc., which has been coate
|
