| http://www.w3.org/ns/prov#value | - In one aspect, the invention is a system and method that utilizes matching the emissivity value of the surfaces of a process chamber that oppose exposed surfaces...http://www.google.es/patents/US7771563?utm_source=gb-gplus-sharePatente US7771563 - Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems B???squeda avanz
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