| http://www.w3.org/ns/prov#value | - In addition, a portion between elements thereof is filled with interlayer insulation film 7 formed of an insulation film such as silicon dioxide film or silicon nitride film, and the two thereof are isolated fromeach other.Next, as illustrated in FIG. 3, after an opening is formed in interlayer insulation film 7 by photolithography and dry etching techniques and a conductive film is deposited over
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