PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • FIG. 2 is a side sectional view of a wafer portion having the prior art overlay metrology pattern of FIG. 1, illustrating a test pattern that has been rendered asymmetric by a planarization (CMP) process.
http://www.w3.org/ns/prov#wasQuotedFrom
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