| http://www.w3.org/ns/prov#value | - Similarly, FIG. 3B illustrates that when an increased negative amplitude voltage waveform or signal, such as the waveforms or signals discussed above in connection with FIGS. 2A and 2B, is applied to the semiconductor wafer 104 during the plasma etching process, the positive charge that is accumulated on the bottom surface 150 of the opening 144 is thus urged in the direction of the arrow 170 as a
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