PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • In this embodiment, an insulating film including silicon is formed in thickness from 30 to 200 nm by the sputtering method.
http://www.w3.org/ns/prov#wasQuotedFrom
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