About: http://webisa.webdatacommons.org/270929004

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Consequently, etching of silicon material (e.g., silicon and material including silicon), typically used for gate electrodes of MOS transistors, has gradually shifted from isotropic wet etching to anisotropic dry etching.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com