| http://www.w3.org/ns/prov#value | - ion process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltageUS7078711Feb 13, 2004Jul 18, 2006Applied Materials, Inc.Matching dose and energy of multiple ion implantersUS7137354Aug 22, 2003Nov 21, 2006Applied Materials, Inc.Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltageUS20
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