About: http://webisa.webdatacommons.org/272177550

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	When an Si oxide film is formed by a plasma CVD, therefore, a phenomenon, that a reactant is deposited on portions other than a semiconductor, for example, on an inner wall of a chamber on which an Si oxide film is formed, takes place.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com