| http://www.w3.org/ns/prov#value | - io frequency power to generate gases, and applying voltage to an electrode of the electrostatic chuckUS7137354 *22 Aug 200321 Nov 2006Applied Materials, Inc.Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltageUS714175713 Feb 200428 Nov 2006Applied Materials, Inc.Plasma reactor with overhead RF source power electrode having a r
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