| http://www.w3.org/ns/prov#value | - ion in the cell region where the first well region is formed and a third well region in the peripheral region, performing a third ion implant process to expose regions other than the region in which the second well region is formed in the cell region and the first doped region on the result on which the second ion implant process is performed, thereby forming a fourth well region in a region adjac
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