| http://www.w3.org/ns/prov#value | - A polysilicon film 16 is then deposited in a manner to electrically contact a part of the top surface of the silicon substrate 10 through the hole 14 as illustrated in FIG. 1A. Thereafter, an impurity such as phosphorous is doped into the polysilicon film 16 which serves as a lower electrode of the capacitor.
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