About: http://webisa.webdatacommons.org/281371926

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Then, the gate metal layer is patterned by a photolithography and etching process using a first mask to thereby form a gate pattern including the gate line 2, the gate electrode 8 and the lower gate pad electrode 28.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com