About: http://webisa.webdatacommons.org/283742876

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	hydrochloric acid, sulfuric acid, etc. or the chemicals such as hydrogen peroxide, etc. as the etchant is appropriately heated, the desired etching rate against the ZrN film can be obtained.
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com