| http://www.w3.org/ns/prov#value | - First, as shown in FIG. 3A, by having metal such as Cr (Chromium) deposited entirely on the transparent insulating substrate 8 made of glass or a like and by removing unwanted metal by using known photolithography and etching methods, the gate line 1 (not shown), the gate electrode 1 a, the common storage line 4 (not shown), and the auxiliary capacitive electrode 4 a (not shown) are formed.
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