| http://www.w3.org/ns/prov#value | - Generally, when used to polish such substrates, the cerium oxide composition can be incorporated into a liquid carrier, such as water or a solution comprising chemical reagents (e.g., oxidizers, film forming agents, acids, bases, surfactants, complexing agents, and the like) to form a slurry that can be used to polish the surface of the substrate using, for example, a polishing pad.
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