PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • A spike activation anneal is done at approximately at 1050??? C. In this situation, conductive channels of NMOS and PMOS transistors in the substrate are counter doped using conventional methods, such as ion implantation.
http://www.w3.org/ns/prov#wasQuotedFrom
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