| http://www.w3.org/ns/prov#value | - B2, US7821614B2InventorsGiora Dishon, Moshe Finarov, Zvi Nirel, Yoel CohenOriginal AssigneeNova Measuring Instruments Ltd.Export CitationBiBTeX, EndNote, RefManPatent Citations (62), Non-Patent Citations (1), Classifications (39), Legal Events (1) External Links: USPTO, USPTO Assignment, EspacenetMonitoring apparatus and method particularly useful in photolithographically processing substrates
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