| http://www.w3.org/ns/prov#value | - On the other hand, in general, materials including silicon are known to have a fast etching speed and to yield a high selection ratio with respect to the resist under etching conditions in which a fluorocarbon-based gas is used, and thus it is conceivable that the etching selection ratio can be significantly increased by using an antireflective film that comprises silicon atoms.
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