| http://www.w3.org/ns/prov#value | - rior generation, rather than the typical 30 percent boost, estimated Ronse.???It is likely some design rules at 14 nm will have to be relaxed somewhat,??? said van den Hove in his keynote. ???I believe the time to decide lithography options for 14 nm is basically now, and its clear EUV is not ready for the challenge,??? he added, in response to a question.???There is a tremendous effort to solve t
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