| http://www.w3.org/ns/prov#value | - Preferably, an insulator layer of an electrically insulating material such as silicon dioxide or silicon nitride is formed on the major surface around the ohmic contact of the electrode layer to the major surface, and the electrode layer extends over the insulator layer around the second PN junction to extend the space-charge region of the PN junction at the major surface of the semicon ductor bod
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