| http://www.w3.org/ns/prov#value | - resist pattern of FIGS. -1 and 2; FIG. 3 is a section taken on the line 3--3 of FIG. 1; FIGS. 3a, 3b and 3c are sectional views, taken on the line 3-3 of FIG. 1, showing later stages in the etching treatment corresponding to those illustrated in FIGS. 2a, 2b and 20 respectively; IG. 4 is a plan view illustrating a finished abrading device of the type wherein the etching is carried completely throu
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