| http://www.w3.org/ns/prov#value | - A resist composition comprising a base resin, an acid release agent capable of generating an acid upon exposure to light, and a dissolution inhibitor containing an acid unstable group, said base resin being represented by the following rational formula (1), (2) or (3): ##STR29## wherein each of R1 and R3 is a hydrogen atom or methyl group, R2 is a tert-butyl group, and letters a and b satisfy a+b=
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