| http://www.w3.org/ns/prov#value | - A resist composition according to claim 28, wherein the polymer soluble in an alkaline developing solution is one shown by the general formula [10] (wherein R11, R12, R13 and R14 are each independently a hydrogen atom or a methyl group, R15 is a hydrogen atom or a lower alkyl group, R16 is a lower alkyl group, and R15 and R16 may form an alicyclic ring together with a carbon atom to which they are
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