| http://www.w3.org/ns/prov#value | - Examples of the dry method include physical vapor deposition such as electron beam deposition, dielectric heating deposition, resistance heating deposition, sputtering, and ion plating and plasma CVD. When it is formed by a dry method, the anti-reflection layer 23 can contain inorganic compound components such as silicon oxide, magnesium oxide, niobium oxide, titanium oxide, tantalum oxide, alumin
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