About: http://webisa.webdatacommons.org/296363262

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	However, the use of some sort of wet or isotropic etch will form the oval trench 522 in FIGS. 28-29 which will enhance fringe capacitance protection using the low-K dielectric process of FIG. 30-31.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com