About: http://webisa.webdatacommons.org/296564427

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	However, as device dimensions and interconnect features shrink, sputter etching has become inadequate for removing metal oxides, particularly copper oxides, within the smaller interconnect features.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com