About: http://webisa.webdatacommons.org/29746612

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In another aspect, the present invention is a method of chemically and mechanically polishing a semiconductor wafer having a substrate and a surface film.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com