PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • The present invention is particularly suitable for silicon wafers which are coated with a thin film of an appropriate metallic nitride by a chemical vapor deposition or in a plasma activated deposition.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com