About: http://webisa.webdatacommons.org/297837717

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The insulation layer 126 may be planarized by a planarization process such as a CMP process, an etch back process, or a combination process of CMP and etch back until the first hard mask 114 is exposed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com